An analysis of electron scattering is presented, into short and long range components, and a comparison is made with the conventional decomposition into forward and back scattering. A generalized ν is defined in place of the usual backscattering coefficient. Results are shown, in terms of Monte Carlo simulation, relative to some cases of practical interest. In particular, a quite general system is discussed for master-mask fabrication. The limits of the conventional approach are demonstrated.

The generalized backscattering coefficient: a novel parameter in electron scattering processes

MESSINA G;S. SANTANGELO;
1992-01-01

Abstract

An analysis of electron scattering is presented, into short and long range components, and a comparison is made with the conventional decomposition into forward and back scattering. A generalized ν is defined in place of the usual backscattering coefficient. Results are shown, in terms of Monte Carlo simulation, relative to some cases of practical interest. In particular, a quite general system is discussed for master-mask fabrication. The limits of the conventional approach are demonstrated.
1992
ELECTRON SCATTERING, MONTE CARLO SIMULATION, MASK FABRICATION
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Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/20.500.12318/623
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