The careful design of active and passive silicon-based optoelectronic devices requires the precise knowledge of the refractive index and its modification with temperature. The thermo-optic coefficient ((partial)n/(partial)T) of silicon has been therefore measured in the temperature range from 30 to 300 degree(s)C at the important wavelength of 1.5 micrometers for fiber-optic communication applications. The adopted technique is very simple and reliable, and is based on the measurement of the modal shift induced by temperature variations in a Fabry-Perot resonant cavity made of the material to be characterized, namely silicon. As an interferometric measure scheme, the technique provides high precision and sensitivity. Various samples of silicon were characterized, differing in doping type, doping level, and crystal plane orientation. The reported data allows to rule out the temperature dependence of the thermo-optic coefficient of silicon on the considered technological parameters.

Measurement and exploitation of the thermo-optic effect in silicon for light switching in optoelectronic integrated circuits

DELLA CORTE, Francesco Giuseppe
2000

Abstract

The careful design of active and passive silicon-based optoelectronic devices requires the precise knowledge of the refractive index and its modification with temperature. The thermo-optic coefficient ((partial)n/(partial)T) of silicon has been therefore measured in the temperature range from 30 to 300 degree(s)C at the important wavelength of 1.5 micrometers for fiber-optic communication applications. The adopted technique is very simple and reliable, and is based on the measurement of the modal shift induced by temperature variations in a Fabry-Perot resonant cavity made of the material to be characterized, namely silicon. As an interferometric measure scheme, the technique provides high precision and sensitivity. Various samples of silicon were characterized, differing in doping type, doping level, and crystal plane orientation. The reported data allows to rule out the temperature dependence of the thermo-optic coefficient of silicon on the considered technological parameters.
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Utilizza questo identificativo per citare o creare un link a questo documento: http://hdl.handle.net/20.500.12318/14967
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